Description
LAM Research 4520 TCP Oxide Etch System
| Mounting | Bulkhead |
| Wafer Size | 200 MM |
| Software | Envision 1.52 |
| Indexers | HINE |
| AC Box | -002 |
| Gas Box | Orbital Welded |
| Clamping | ESC |
| Backside Helium | Closed Loop |
| Generator | PDW 2200 |
| RF Match | LOFAT |
| Endpoint | Monochrometer |
| MFCs | Unit 1660 |
Gas Config:
| Gas 1 | Ar 1000 |
| Gas 2 | N2 200 |
| Gas 3 | O2 200 |
| Gas 4 | CH4 200 |
| Gas 5 | CHF3 50 |
| Gas 6 | SF6 50 |
| Gas 7 | O2 1000 |
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